VS0017 Silicon Wafer Alkaline Cleaning Additive

  • VS0017 Silicon Wafer Alkaline Cleaning Additive
  • VS0017 Silicon Wafer Alkaline Cleaning Additive
  • VS0017 Silicon Wafer Alkaline Cleaning Additive
  • VS0017 Silicon Wafer Alkaline Cleaning Additive
  • VS0017 Silicon Wafer Alkaline Cleaning Additive
  • VS0017 Silicon Wafer Alkaline Cleaning Additive
  • VS0017 Silicon Wafer Alkaline Cleaning Additive
VS0017 Silicon Wafer Alkaline Cleaning Additive
  • RISE
  • Liaoning, China
  • 7days
  • 50mt/Month

* Removes oils and particles effectively, enhancing light absorption.
* Low-corrosive formula protects wafer surface integrity.
* Heavy metal-free, RoHS compliant, easy wastewater treatment.
* Compatible with mono/polycrystalline wafers and various equipment.
* Concentrated formula reduces usage cost.

VS0017 Silicon Wafer Alkaline Cleaning Additive


PRODUCT

INTRODUCTION

VS0017 Silicon Wafer Alkaline Cleaning Additive is an environmentally friendly additive for alkaline cleaning in monocrystalline silicon texturing. It is non-toxic, odorless, non-corrosive, non-irritating, and poses no fire or explosion hazards. Alkaline Cleaning Additive is suitable for alkaline cleaning during texturing, alkali polishing, and RCA stages.

It assists hydrogen peroxide in cleaning and conditioning silicon wafer surfaces before and after texturing, reducing hydrogen peroxide consumption. Alkaline Cleaning Additive enhances the removal of organic contaminants and metallic impurities from surfaces.


PRODUCT  CHARACTERISTICS

  • Removes oils and particles effectively, enhancing light absorption.

  • Low-corrosive formula protects wafer surface integrity.

  • Heavy metal-free, RoHS compliant, easy wastewater treatment.

  • Compatible with mono/polycrystalline wafers and various equipment.

  • Concentrated formula reduces usage cost.


PRODUCT  PARAMETER


Product Name

Alkaline Cleaning Additive/Solar wafer cleaner/PV cleaning agent

AppearanceYellow transparent liquid
Relative density1.05-1.15
OdorNearly odorless
pH value (undiluted solution)12.00-14.00
Implementation StandardsQ/SDVS 010


 PRODUCT  APPLICATION

Alkaline Cleaning Additive is suitable for alkaline cleaning during texturing, alkali polishing, and RCA stages.It assists hydrogen peroxide in cleaning and conditioning silicon wafer surfaces before and after texturing, reducing hydrogen peroxide consumption. Alkaline Cleaning Additive enhances the removal of organic contaminants and metallic impurities from surfaces.


PACKAGING

Packaging Specifications: 10 liters per drum

Shelf Life: Six months when stored sealed in a cool, well-ventilated warehouse.


ABOUT US

Alkaline Cleaning Additive

RISE CHELICAM Laos production base is located in Sai Serta Comprehensive Development Zone, Vientiane, Laos, with a building area of 30,000 square meters, is a comprehensive solution provider of wet electronic chemicals and industrial and commercial specialty chemicals, specializing in serving Southeast Asia.

The Laos plant is equipped with advanced production equipment and automated control system, with an annual production capacity of 100,000 tons. The Laos production base adopts advanced purification technology and patented formulation technology, which provides a strong guarantee for the high efficiency and stability of the products. 

Solar wafer cleaner


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